• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    1532862 Automatic control CARL-ZEISS JENA VEB 25 Aug 1976 [24 Sept 1975] 35384/76 Heading G3N In a scanning electron microscope system for measuring the separation of two points on a specimen 9, image signals 13 from detectors 10, 11, 12 are fed via circuitry 16 to a cathode ray tube, e.g. 20, associated with a device 23 which projects a calibrated grid on to the c.r.t. screen; a distance which is measured using the grid being the sum of a relatively small displacement of the electron beam caused and measured by a deflection system 21x, 21y, and a relatively large displacement caused by movement of the specimen and measured by a further measuring system. The two displacements are automatically combined and fed to a display unit 22. The arrangement permits the measurement of distances up to a decimetre with an accuracy of a tenth of a micrometre. The positioning of the specimen may be preselected and actuated via data input member 29 either manually or by numerical control, e.g. punched tape. The specimen is moved by stepping motors 27 under the control of a computer 28, and the x and y displacements of the specimen are measured by a laser system 30 incorporating measuring prisms 31 and reference prisms 32.
    公开号:SU1191980A1
    申请号:SU762399525
    申请日:1976-09-20
    公开日:1985-11-15
    发明作者:Хох Вольфганг；Вильд Герхард
    申请人:Volfgang Khokh；Gerkhard Vild；
    IPC主号:
    专利说明:

    (Y
    with
    00
    This invention relates to an electron. microscopy and can be used to measure the distance between the structures of an object, mainly objects of microelectronics, for example, semiconductor washers and photomasks.
    The aim of the invention is to increase the accuracy of c, reducing the time of distance measurement.
    , FIG. 1 shows the general scheme of REM in FIG. 2 is a scale grid for measuring distances.
    . A source of electron electrons 2, a system of reducing electromagnetic lenses 3 and 4, an electromagnetic stigmator 5 and an aperture diaphragm 6 for forming a thin-focused beam of primary electrons 7 are placed in an evacuated electron-optical column 1 (Fig. 1); Inside the working channel of the lens 4 is placed the main deflection system 8, designed to rasterize the surface of the object 9 in the direction of the axes X and Y. Near the surface of the object detectors 10 and 11 electrons and the sensor 12 are installed, having 13 inputs from column 1. The generator 14 by means of an electric circuit 15 with a diverting system 8 and with the help of a switch 16 with systems 17 deviations of indicator units 18, 19, 20 With the help of an electric circuit 15, which is a control amplifier, it is possible to adjust the magnifications e, change currents in the coils of the main deflection system 8.
    The electron-beam measurement system contains a positioning device in the form of an additional deflection system 21 associated with the generator 22 of digital scanning of the position of the position in the direction of the axes X and Y with a calibrated step of 0.02 µm in a diagonal range of 10 µm. Electron beam positioning is carried out manually by moving the arrow on the sweep generator 22, or automatically, when the switch 23 is on, between the sweep generator 21 and the control unit 24. The control unit can be based on a small control computer of the KSR4100 1 type (Robotron, GDR The deviation in the form of a sequence of integers with a step corresponding to the value of 0.02 µm.
    It can be automatically transferred with a sign to the reference device 25, which can also display the measurement result of the laser measuring system.
    The indicator unit 20 is adapted to be projected onto the screen of a calibrated scale grid, which is implemented with an add-on device 26. The scale grid is designed in such a way that the exact magnification and distortion of the geometric shape at the edges of the image is learned.
    The object camera 27 contains a precision coordinate table 28 with a range of movement of the object holder up to one decimeter in the X and Ts axes direction. Precise lead screws 29, which are connected to the coordinate table 28, and stepper motors 30 with control units provide remote control of the movement of the object holder. Stepper motors 30 are associated with a control unit 24, the peripheral portion 31 of which serves for data entry.
    Control unit 24 serves for. complete control of table 28 and comparison of the target value of the displacement of an object with the average true value measured by a laser measuring system connected to the feedback loop of the table control.
    The laser measuring system is equipped with a He-Ne laser and forms an incremental measuring system with an increment of 04 microns.
    Two measuring prisms 32 of the laser measuring system for the X and Y directions are located directly on the coordinate table 28. Two comparison prisms for the X and Y directions are located in the chamber of 27 objects in such a way that there is a small relative displacement between the measuring prisms and the prisms Comparison with the temperature of the camera object. Additionally, a device 34 can be provided for stabilizing the temperature in the chamber of the 27 objects. The monitoring device also contains an amplifier 35 coupled to the switch 16.
    FIG. 2 shows the grid 36 with the center 37 and the edge 38, 39 of the structure of the object.
    The image of the edge 38 of the structure of the object 9, obtained using the SEM by entering the coordinates into the peripheral part 31 of the control unit 24 for moving the table 28 objects at. a certain increase, is displayed in the center of the screen of the indicator unit. Due to the inaccurate input of coordinates relative to the zero point of the object coordinates and the positioning error of the table edge, the structure edge 38 is not exactly in the center of the screen, but offset by the distance d. This distance is determined using the projected scale grid 36, which in practice at 10000 magnification is a two-dimensional grating with a 1 mm pitch and corresponds to a 0.1 µm pitch in the plane of the object. In addition, readings D of the device 25 o are calculated, based on the counting of the laser measuring system.
    After that, the image of the structure 39 of the object 9 is positioned, if possible, in the center of the screen by inputting the corresponding coordinates and then moving the table 28. The edge 30 of the structure is generally located at a distance d, which is also determined using the scale projected onto the reflection grids 36.
    In addition, readings D2 of the reference device 25 of the laser measuring system are taken and the distance between the edges of the structures 38 and 39 is calculated by the formula
    A D2-D + d2-d;
    The value of d is advisable to bring to zero the movement of the edge 38 of the structure using an electron-beam positioning device in the center 37 of the screen, and the value of D - by zeroing the device 25 of the reference laser measuring system. Then the required distance is calculated as follows.
    ,
    where the value of D is the movement of the object measured by the laser measuring system, and the value of d is determined using the scale grid, or by moving the edge of the structure 39 by means of a positioning device to the center of the screen and counting the corresponding movement steps. At the same time, the edges of the structure always move to the center of the screen until they overlap with the center 37 of the mesh scale 36.
    When automatically adding the measured value D of a laser measuring system to move an object with a value of d, electron beam positioning draws the edges of the structures 38 and 39 using the positioning device in turn until it aligns with the center 37 of the screen. Then, the measured distance value is automatically obtained and read from the reference unit 25 of the control unit 24.
    To determine the distances between the structures of the object, which can be fully represented on the screen, only an electron-beam measuring system operating with high accuracy is used. For this, the edges of the structures 38 and 39 are driven by a corresponding number of steps in the positioning device successively until the edges overlap with the center of the scale grid while the object remains stationary. The difference in the number of movement steps to achieve overlapping of the edges of the structures with the center of the grid determines the distance sought.
    Thus, the combined use of a laser measuring system and an electron-laser positioning device makes it possible to measure distances with high accuracy in a wide range of values of 0.1 to 10,000 microns with minimal time expenditure.
    38 36
    权利要求:
    Claims (1)
    [1]
    '' RASTER ELECTRONIC MICROSCOPE containing an electron source sequentially placed inside the Column, an electromagnetic lens system, a stigmatator, an aperture diaphragm, a main deflecting system and an object holder moving mechanism with spindles associated with step electric motors, as well as a two-coordinate laser measuring system for moving the object holder and video controller including an electron detector, an amplifier and an indicator unit with a cathode ray tube, characterized by then, in order to increase accuracy, and reduce the distance measuring time, it is provided with electron beam measuring system comprising a positioning device in the form of additional deflection system connected to a generator of digital scans, and the control β unit connected to the generator S digital sweeps output laser measuring system and stepper motors, and the indicator unit is configured to project a large-scale grid.
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    同族专利:
    公开号 | 公开日
    DE2635356C2|1984-08-16|
    FR2326030A1|1977-04-22|
    FR2326030B1|1982-03-19|
    DE2635356A1|1977-04-07|
    DD124091A1|1977-02-02|
    GB1532862A|1978-11-22|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    US3876879A|1973-11-09|1975-04-08|Calspan Corp|Method and apparatus for determining surface characteristics incorporating a scanning electron microscope|AU534811B2|1979-07-03|1984-02-16|Unisearch Limited|Atmospheric scanning electron microscope|
    JPH0352178B2|1980-12-05|1991-08-09|Hitachi Ltd|
    JPS6356482B2|1982-11-29|1988-11-08|Tokyo Shibaura Electric Co|
    JPH0349042B2|1983-03-09|1991-07-26|Hitachi Ltd|
    JPS61502486A|1984-03-20|1986-10-30|
    US4677296A|1984-09-24|1987-06-30|Siemens Aktiengesellschaft|Apparatus and method for measuring lengths in a scanning particle microscope|
    DE3802598C1|1988-01-29|1989-04-13|Karl Heinz 3057 Neustadt De Stellmann|
    法律状态:
    优先权:
    申请号 | 申请日 | 专利标题
    DD18851275A|DD124091A1|1975-09-24|1975-09-24|
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